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Equipment

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Specifications

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Features

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Examples of application

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3" Cathode (CFS-4EP-LL:1 unit / CFS-4ES-231:1 unit)



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Power supply

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CFS-4EP-LL
RF:500W
DC:500Wx 2 /
CFS-4ES-231
RF:500Wx2
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With plenty of stocks of various targets
(Experimental use available)

Reverse sputtering onto the substrate available

Reverse sputtering onto the substrate available

Simultaneous reactivity dual sputtering: reactive coating by O2 or N2 gas available
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Applicable substrates

Glasses
Plastics(including Polyimide)
Ceramics
Films etc.
Examples of sputtering performance

Electrodes of various devices
Transparent conductive films
Reflective films
Coatings for ornaments
Dielectric films
Barrier metal films
Resist films
Ferroelectric films
Wear-proof films related to various sensors
Oxidization protection films for compound semiconductors
Amorphous Silicon films

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Gas
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Ar,N2,O2
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Heating temperature
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270 C
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6" Cathode(SH-450-C10)



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Power supply
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RF:3KW
DC:5KW
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Mainly and specially used for metal targets

Static sputtering right above the target is possible

With function of etching cleaning by high frequency
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Gas
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Two lines Mass flow control
Ar only,For reactant gas (O2 or N2)
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Heating temperature
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250 C
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8" Cathode (CFS-12P-100)



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Power supply
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RF:4KW
DC:5KW
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Good homogeneity of the sputtering distribution on the substrate

Number of substrates per batch

50 Wafer : 100 pcs
100 Wafer : 30 pcs
150 Wafer : 16 pcs
300 Wafer : 4 pcs
100*100 Square plate : 28 pcs
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Gas
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Ar,N2,O2
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Heating temperature
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200 C
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In line type(MLH-6315RD)



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Power supply
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RF:3KW
DC:10KW
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Sputtering room is separated from prepararion room.

Inter back system
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Gas
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Two lines Mass flow control
Ar only, For reactant gas (O2 or N2)
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Heating temperature
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200 C
(Heating system of fix before coating)
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Inquiry from customers
Techno Fine's assistance to the customer's development of fine coating
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Preparation
Various fixtures available
*Flexible fixture
*Special fixture
*Fixed with heat-resistant tape
*Fixed with SUS mask
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Thin film coating
(Test and Actual coating)
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Cooperating with related companies, Techno Fine will correspond widely to your needs for evaluation.
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Furthermore, Techno Fine will serve you by such thin film coatings as ion plating, vacuum evaporation. CVD and PVD, etc., and by supplying various wafers and glass substrates too.
The inquiry about the contents is requested to move to Inquiry
Contact point:Techno Fine Co., Ltd. Sales & Marketing Department (2-6-1 Kuriki, Asao-ku, Kawasaki-shi, Kanagawa, 215-0033, Japan)
TEL: +81-44-986-7041 FAX: +81-44-986-7042( E-mail: tf@techno-fine.co.jp)
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Copyright (C) 2003 Techno Fine Co.,Ltd. All Rights Reserved

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